Electrosurgical systems and methods

ABSTRACT

System and methods of an electrosurgical controller having multiple modes of operation that are configured for treatment of a specific targeted tissue type and the electrosurgical effect desired where the treatment and effect are provided by a single controller and an electrosurgical probe. The electrosurgical controller includes an integrated fluid control apparatus or pump where activation of the controller allows for selective energy delivery and corresponding fluid volume flow rates. The electrosurgical probe includes a fluid transport lumen and is in communication with the controller and the pump for operation of the probe in the various user selected modes with accompanying energy delivery and fluid control directed to the desired treatment and surgical effect.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. patent application Ser. No.15/098,824 filed Apr. 14, 2016, which is a divisional of U.S. patentapplication Ser. No 14/238,799 filed Feb. 13, 2014, U.S. Pat. No.9,333,024 issued May 10, 2016, which is a 371 U.S. application of PCTApplication No. PCT/US2013/029501 filed Mar. 7, 2013, the completedisclosure of which is incorporated herein by reference for allpurposes.

BACKGROUND

Electrosurgical systems are used by physicians to perform specificfunctions during surgical procedures. Within these procedures, it may benecessary to treat more than one type of tissue or to create more thanone manner of tissue effect. Existing electrosurgical systems aretypically designed with limited functionality, and are not alwaysparticularly effective for treating varying tissue types. In the eventthat a procedure requires multiple types of tissue to be treated, theuse of a single device may produce poor results in certain aspects ofthe procedure and necessitate that a user have available or switchbetween several surgical instruments to obtain the desired surgicalresult. For example, particular electrosurgical procedures in the kneeor shoulder may require several different modes of operation toeffectively treat different types of tissue. Each mode may utilize adifferent amount of energy, and in the related art each mode may involvethe use of different electrosurgical wands and different electrosurgicalcontrollers. In some cases, a surgeon may forgo use of the correct wandand/or electrosurgical controller to reduce expenses of the procedure,when better clinical results may have been achieved using multipleelectrosurgical wands.

Any advance that makes treatment easier for the surgeon, and achievesbetter results, would provide a competitive advantage.

BRIEF DESCRIPTION OF THE DRAWINGS

For a detailed description of exemplary embodiments, reference will nowbe made to the accompanying drawings in which:

FIG. 1 shows an electrosurgical system in accordance with at least someembodiments;

FIG. 2 shows an elevation view of an electrosurgical wand in accordancewith at least some embodiments;

FIG. 3 shows a cross-sectional elevation view of an electrosurgical wandin accordance with at least some embodiments;

FIG. 4 shows both an elevation view of screen electrode, and aperspective view of a distal end of an electrosurgical wand comprisingthe screen electrode, in accordance with at least some embodiments;

FIG. 5 shows an electrical block diagram of a controller in accordancewith at least some embodiments; and

FIG. 6 shows an example graph relating output RF energy and aspirationflow of various modes in accordance with at least some embodiments;

FIG. 7 shows a method in accordance with at least some embodiments.

NOTATION AND NOMENCLATURE

Certain terms are used throughout the following description and claimsto refer to particular system components. As one skilled in the art willappreciate, companies that design and manufacture electrosurgicalsystems may refer to a component by different names. This document doesnot intend to distinguish between components that differ in name but notfunction.

In the following discussion and in the claims, the terms “including” and“comprising” are used in an open-ended fashion, and thus should beinterpreted to mean “including, but not limited to. . . . ” Also, theterm “couple” or “couples” is intended to mean either an indirect ordirect connection. Thus, if a first device couples to a second device,that connection may be through a direct connection or through anindirect connection via other devices and connections.

Reference to a singular item includes the possibility that there areplural of the same items present. More specifically, as used herein andin the appended claims, the singular forms “a,” “an,” “said” and “the”include plural references unless the context clearly dictates otherwise.It is further noted that the claims may be drafted to exclude anyoptional element. As such, this statement serves as antecedent basis foruse of such exclusive terminology as “solely,” “only” and the like inconnection with the recitation of claim elements, or use of a “negative”limitation. Lastly, it is to be appreciated that unless definedotherwise, all technical and scientific terms used herein have the samemeaning as commonly understood by one of ordinary skill in the art towhich this invention belongs.

“Ablation” shall mean removal of tissue based on tissue interaction witha plasma.

“Mode of ablation” shall refer to one or more characteristics of anablation. Lack of ablation (i.e., a lack of plasma) shall not beconsidered an “ablation mode.” A mode which performs coagulation shallnot be considered an “ablation mode.”

“Active electrode” shall mean an electrode of an electrosurgical wandwhich produces an electrically-induced tissue-altering effect whenbrought into contact with, or close proximity to, a tissue targeted fortreatment.

“Return electrode” shall mean an electrode of an electrosurgical wandwhich serves to provide a current flow path for electrical charges withrespect to an active electrode, and/or an electrode of an electricalsurgical wand which does not itself produce an electrically-inducedtissue-altering effect on tissue targeted for treatment.

“Electric motor” shall include alternating current (AC) motors, directcurrent (DC) motors, as well as stepper motors.

“Controlling flow of fluid” shall mean controlling a volume flow rate.Control of applied pressure to maintain a set point pressure (e.g.,suction pressure) independent of volume flow rate of liquid caused bythe applied pressure shall not be considered “controlling flow offluid.” However, varying applied pressure to maintain a set point volumeflow rate of liquid shall be considered “controlling flow of fluid”.

“Substantially”, in relation to exposed surface areas of electrodes,shall mean that exposed surface areas as between two electrodes aresame, or differ by no more than twenty five (25) percent.

A fluid conduit said to be “within” an elongate shaft shall include notonly a separate fluid conduit that physically resides within all or aportion of an internal volume of the elongate shaft, but also situationswhere the internal volume of the elongate shaft is itself the fluidconduit or where a separate fluid conduit is connected along the lengthof or to a portion of the elongate shaft.

Where a range of values is provided, it is understood that everyintervening value, between the upper and lower limit of that range andany other stated or intervening value in that stated range isencompassed within the invention. Also, it is contemplated that anyoptional feature of the inventive variations described may be set forthand claimed independently, or in combination with any one or more of thefeatures described herein.

All existing subject matter mentioned herein (e.g., publications,patents, patent applications and hardware) is incorporated by referenceherein in its entirety except insofar as the subject matter may conflictwith that of the present invention (in which case what is present hereinshall prevail). The referenced items are provided solely for theirdisclosure prior to the filing date of the present application. Nothingherein is to be construed as an admission that the present invention isnot entitled to antedate such material by virtue of prior invention.

DETAILED DESCRIPTION

Before the various embodiments are described in detail, it is to beunderstood that this invention is not limited to particular variationsset forth herein as various changes or modifications may be made, andequivalents may be substituted, without departing from the spirit andscope of the invention. As will be apparent to those of skill in the artupon reading this disclosure, each of the individual embodimentsdescribed and illustrated herein has discrete components and featureswhich may be readily separated from or combined with the features of anyof the other several embodiments without departing from the scope orspirit of the present invention. In addition, many modifications may bemade to adapt a particular situation, material, composition of matter,process, process act(s) or step(s) to the objective(s), spirit or scopeof the present invention. All such modifications are intended to bewithin the scope of the claims made herein.

The various embodiments are directed to electrosurgical methods andrelated electrosurgical systems. In particular, the various embodimentsare directed to an electrosurgical system having multiple modes ofoperation that are configured for treatment of a specific targetedtissue type or electrosurgical effect desired, and implemented by asingle electrosurgical wand and a single electrosurgical controller. Inexample embodiments, the multiple modes of operation are implemented bya single active electrode on the electrosurgical wand. The specificationfirst turns to an illustrative system to orient the reader.

FIG. 1 illustrates an electrosurgical system 100 in accordance with atleast some embodiments. In particular, the electrosurgical system 100comprises an electrosurgical wand 102 (hereinafter “wand 102”) coupledto an electrosurgical controller 104 (hereinafter “controller 104”). Thewand 102 comprises an elongate shaft 106 that defines distal end 108.The elongate shaft 106 further defines a handle or proximal end 110,where a physician grips the wand 102 during surgical procedures. Thewand 102 further comprises a flexible multi-conductor cable 112 housingone or more electrical leads (not specifically shown in FIG. 1), and theflexible multi-conductor cable 112 terminates in a wand connector 114.As shown in FIG. 1, the wand 102 couples to the controller 104, such asby a controller connector 120 on an outer surface of the enclosure 122(in the illustrative case of FIG. 1, the front surface).

Though not visible in the view of FIG. 1, in some embodiments the wand102 has one or more internal fluid conduits coupled to externallyaccessible tubular members. As illustrated, the wand 102 has a flexibletubular member 116, used to provide aspiration at the distal end 108 ofthe wand. In accordance with various embodiments, the tubular member 116couples to a peristaltic pump 118, which peristaltic pump 118 isillustratively shown as an integral component with the controller 104(i.e., residing at least partially within the enclosure 122 of thecontroller 104). In other embodiments, an enclosure for the peristalticpump 118 may be separate from the enclosure 122 for the controller 104(as shown by dashed lines in the figure), but in any event theperistaltic pump is operatively coupled to the controller 104.

The peristaltic pump 118 comprises a rotor portion 124 (hereafter just“rotor 124”) as well as a stator portion 126 (hereafter just “stator126”). The flexible tubular member 116 couples within the peristalticpump 118 between the rotor 124 and the stator 126, and movement of therotor 124 against the flexible tubular member 116 causes fluid movementtoward the discharge 128. While the illustrative peristaltic pump 118 isshown with a two-head rotor 124, varying types of peristaltic pumps 118may be used (e.g., a five head peristaltic pump). In the context of thevarious embodiments, the peristaltic pump 118 creates avolume-controlled aspiration from a surgical field at the distal end 108of the want 102, with the control based on a speed of the rotor 124, ascommanded by the controller 104.

Still referring to FIG. 1, a display device or interface device 130 isvisible through the enclosure 122 of the controller 104, and in someembodiments a user may select operational modes of the controller 104 byway of the interface device 130 and/or related buttons 132. For example,using one or more of the buttons 132 the surgeon may select amongablation modes, such as: a low mode which may be used for removal ofportions of cartilage; a medium mode which may be used for removal ofmeniscus; a high mode for aggressive removal of tissue; and a vacuummode for removal free floating and/or trapped tissue. The various modesof operation are discussed more thoroughly below.

In some embodiments the electrosurgical system 100 also comprises a footpedal assembly 134. The foot pedal assembly 134 may comprise one or morepedal devices 136 and 138, a flexible multi-conductor cable 140 and apedal connector 142. While only two pedal devices 136 and 138 are shown,one or more pedal devices may be implemented. The enclosure 122 of thecontroller 104 may comprise a corresponding connector 144 that couplesto the pedal connector 142. A physician may use the foot pedal assembly134 to control various aspects of the controller 104, such as the modeof ablation. For example, pedal device 136 may be used for on-offcontrol of the application of radio frequency (RF) energy to the wand102, and more specifically for control of energy in an ablation mode.Further, pedal device 138 may be used to control and/or set the mode ofablation of the electrosurgical system. For example, actuation of pedaldevice 138 may switch between energy levels created by the controller104 and aspiration volume created by the peristaltic pump 118. Incertain embodiments, control of the various operational or performanceaspects of controller 104 may be activated by selectively depressingfinger buttons located on handle 110 of wand 102.

The electrosurgical system 100 of the various embodiments may have avariety of modes of operation which employ Coblation® technology. Inparticular, the assignee of the present disclosure is the owner ofCoblation® technology. Coblation® technology involves the application ofa radio frequency (RF) signal between one or more active electrodes andone or more return electrodes of the wand 102 to develop high electricfield intensities in the vicinity of the target tissue. The electricfield intensities may be sufficient to vaporize an electricallyconductive fluid over at least a portion of the one or more activeelectrodes in the region between the one or more active electrodes andthe target tissue. The electrically conductive fluid may be inherentlypresent in the body, such as blood, or in some cases extracelluar orintracellular fluid. In other embodiments, the electrically conductivefluid may be a liquid or gas, such as isotonic saline. In someembodiments, such as surgical procedures involving a knee or shoulder,the electrically conductive fluid is delivered in the vicinity of theactive electrode and/or to the target site by a delivery system separateand apart from the system 100.

When the electrically conductive fluid is energized to the point thatthe atoms of the fluid vaporize faster than the atoms recondense, a gasis formed. When sufficient energy is applied to the gas, the atomscollide with each other causing a release of electrons in the process,and an ionized gas or plasma is formed (the so-called “fourth state ofmatter”). Stated otherwise, plasmas may be formed by heating a gas andionizing the gas by driving an electric current through the gas, or bydirecting electromagnetic waves into the gas. The methods of plasmaformation give energy to free electrons in the plasma directly,electron-atom collisions liberate more electrons, and the processcascades until the desired degree of ionization is achieved. A morecomplete description of plasma can be found in Plasma Physics, by R. J.Goldston and P. H. Rutherford of the Plasma Physics Laboratory ofPrinceton University (1995), the complete disclosure of which isincorporated herein by reference.

As the density of the plasma becomes sufficiently low (i.e., less thanapproximately 1020 atoms/cm³ for aqueous solutions), the electron meanfree path increases such that subsequently injected electrons causeimpact ionization within the plasma. When the ionic particles in theplasma layer have sufficient energy (e.g., 3.5 electron-Volt (eV) to 5eV), collisions of the ionic particles with molecules that make up thetarget tissue break molecular bonds of the target tissue, dissociatingmolecules into free radicals which then combine into gaseous or liquidspecies. By means of the molecular dissociation (as opposed to thermalevaporation or carbonization), the target tissue is volumetricallyremoved through molecular dissociation of larger organic molecules intosmaller molecules and/or atoms, such as hydrogen, oxygen, oxides ofcarbon, hydrocarbons and nitrogen compounds. The molecular dissociationcompletely removes the tissue structure, as opposed to dehydrating thetissue material by the removal of liquid within the cells of the tissueand extracellular fluids, as occurs in related art electrosurgicaldesiccation and vaporization. A more detailed description of themolecular dissociation can be found in commonly assigned U.S. Pat. No.5,697,882 the complete disclosure of which is incorporated herein byreference.

The energy density produced by electrosurgical system 100 at the distalend 108 of the wand 102 may be varied by adjusting a variety of factors,such as: the number of active electrodes; electrode size and spacing;electrode surface area; asperities and/or sharp edges on the electrodesurfaces; electrode materials; applied voltage; current limiting of oneor more electrodes (e.g., by placing an inductor in series with anelectrode); electrical conductivity of the fluid in contact with theelectrodes; density of the conductive fluid; and other factors.Accordingly, these factors can be manipulated to control the energylevel of the excited electrons. Since different tissue structures havedifferent molecular bonds, the electrosurgical system 100 may beconfigured to produce energy sufficient to break the molecular bonds ofcertain tissue but insufficient to break the molecular bonds of othertissue. For example, fatty tissue (e.g., adipose) has double bonds thatrequire an energy level higher than 4 eV to 5 eV (i.e., on the order ofabout 8 eV) to break. Accordingly, the Coblation® technology in somemodes of operation does not ablate such fatty tissue; however, theCoblation® technology at the lower energy levels may be used toeffectively ablate cells to release the inner fat content in a liquidform. Other modes of operation may have increased energy such that thedouble bonds can also be broken in a similar fashion as the single bonds(e.g., increasing voltage or changing the electrode configuration toincrease the current density at the electrodes). A more completedescription of the various phenomena can be found in commonly assignedU.S. Pat. Nos. 6,355,032, 6,149,120 and 6,296,136, the completedisclosures of which are incorporated herein by reference.

The inventors now present a theoretical underpinning to explain howmultiple modes of operation may be implemented with a single wand 102and a single controller 104. However, the theoretical basis is presentedmerely as one possible explanation, and shall not be read as alimitation on the operation of the various embodiments. Anothertheoretical basis may be equivalently proffered, and attempting toexplain operation of a device using a different theoretical basis shallnot obviate whether such a device falls within the appended claims. Inparticular, the electrode circuit, including the plasma created inoperational relationship to an active electrode of a wand, the fluidbetween the active and return electrode, and the electrode-fluidinterface, has or presents a certain amount of impedance to the flow ofenergy away from the active electrode toward a return electrode. Theimpedance presented by the electrode circuit may be dependent on manyfactors, including but not limited to the thickness and volume of theplasma itself, the surface area of the active electrode not covered by avapor layer and directly in contact with the conductive fluid, and thevolume flow of fluid and/or gasses away from the location of the plasma.

In related-art devices, only the vacuum pressure used for aspiration iscontrolled (e.g., the vacuum available at wall socket connections in ahospital operating room). However, the vacuum available at a wall socketconnection may be highly variable from room to room, and in many caseswithin the same room over time. Moreover, control of vacuum pressureapplied does not imply a controlled volume of aspiration. Thus, whilerelated-art devices may control vacuum pressure (or may specify apreferred vacuum pressure), they do not control volume flow rate of theaspiration.

The various modes of operation are implemented, at least in part and incertain embodiments, by controlling the flow of fluid during theaspiration, rather than merely controlling the applied vacuum pressure.In some embodiments, and as illustrated in FIG. 1, controlling the flowof fluid is by way of a peristaltic pump 118, but other mechanisms tocontrol flow may be equivalently used, including pressure modulation. Inpart by controlling the flow of fluid of the aspiration, the impedanceat the electrode circuit may be at least partially controlled. Thoughother parameters also may also influence impedance, the inventors havefound that lower volume flow of fluid of the aspiration results inhigher electrode circuit impedance by generating a larger plasma andhaving less of the active electrode in direct contact with theconductive fluid and thus less energy dissipation, and higher volumeflow of fluid of the aspiration results in lower impedance and thus moreenergy dissipation. Higher volume flow reduces the size of the plasmaand therefore increases the strength of the electrical field within theplasma.

The inventors have found that the relationship of the volume of flow offluid of the aspiration to energy dissipation is counter to theprevailing understanding. That is, related-art devices and methodsoperate under the assumption that a generally high flow rate morerapidly carries away energy and thus reduces thermal aspects of theablation. By contrast, the inventors have found that high volume flow ofaspiration tends to cause higher energy dissipation overall. That is, ahigh volume flow rate makes the impedance of the electrode circuitlower, which lower impedance increases the energy dissipation. Moreover,higher volume flow rates cause the plasma to “flicker”. Consider ananalogy in the form of a candle. If a candle is burning in a room withvery little air movement, the flame may maintain a steady shape, size,and location. However, in the presence of airflow (e.g., a ceiling fan),the flame tends to “flicker”. If one considers that during periods oftime of plasma collapse (i.e., absence of plasma) greater energy isdissipated in a thermal mode through the surrounding fluid and tissue,“flickering” plasma (plasma which is repeatedly collapsing andre-forming) caused by high volume flow rate may result in more energydissipation in the tissue and surrounding fluid, rather than less. Thatis, not only will the “flickering” plasma present a lower averageimpedance and thus higher energy dissipation, but also the thermal modethat dominates during momentary plasma collapse present in “flicker”causes higher energy dissipation than periods of time when plasma ispresent.

Accordingly, the embodiments described herein are related to a systemwherein the impedance (or RF current applied to an active electrode,which may be used to calculate impedance) at the electrode is monitoredand used as a parameter to control the volume flow rate of aspiration inorder to control the plasma field in a way that is desirable for aspecific tissue type or procedure. For example, if the impedance at theactive electrode is observed to decrease at a point during a procedure(possibly indicating plasma instability), the control module of thesystem may direct the aspiration pump to decrease the aspiration flowrate to enable the plasma field to stabilize. From another perspective,it may be desirable measure the RF current applied to the activeelectrode and adjust the aspiration fluid flow in order to keep thecurrent at a certain predetermined and desired level associated with theuser's operating preference. Additionally, in certain procedures it maybe desirable to sacrifice fluid flow in lieu of stabilizing the plasmafield in order to reduce heat dissipation at the treatment site and toenhance tissue preservation. Reference is also made to commonly assignedU.S. Pat. No. 8,192,424, entitled “ELECTROSURGICAL SYSTEM WITH SUCTIONCONTROL APPARATUS, SYSTEM AND METHOD” the complete disclosure of whichis incorporated herein by reference for all purposes. Conversely, it maybe desirable in certain procedure types to trade off plasma fieldstability in order to have higher overall aspiration fluid flow volumein order to remove bubbles and debris from the surgical field.

Based on the theoretical underpinning in the paragraphs above, thevarious embodiments are directed to systems and related methodsimplementing at least two modes of operation during an electrosurgicalprocedure, in some embodiments using a single wand (and in some cases asingle active electrode) along with a single controller. In a particularembodiment, four different modes of operation may be implemented, suchas: a “low mode” which may be used for the treatment and removal ofsensitive tissue like portions of articular cartilage; a “medium mode”which may be used for the treatment and removal of meniscus; a “highmode” for aggressive removal of tissue of any kind; and a “vacuum mode”for removal of free floating and/or trapped tissue. More detailregarding the illustrative modes of ablation is presented below, after adiscussion of an illustrative wand 102 and internal components of thecontroller 104.

FIG. 2 shows an elevation view of wand 102 in accordance with examplesystems. In particular, wand 102 comprises elongate shaft 106 which maybe flexible or rigid, a handle 110 coupled to the proximal end of theelongate shaft 106, and an electrode support member 200 coupled to thedistal end of elongate shaft 106. Also visible in FIG. 2 is the flexibletubular member 116 extending from the wand 102 and the multi-conductorcable 112. The wand 102 comprises an active electrode 202 disposed onthe distal end 108 of the elongate shaft 106. Active electrode 202 maybe coupled to an active or passive control network within controller 104(FIG. 1) by means of one or more insulated electrical connectors (notshown) in the multi-conductor cable 112. The active electrode 202 iselectrically isolated from a common or return electrode 204 which isdisposed on the shaft proximally of the active electrode 202, in someexample systems within 1 millimeter (mm) to 25 mm of the distal tip.Proximally from the distal tip, the return electrode 204 is concentricwith the elongate shaft 106 of the wand 102. The support member 200 ispositioned distal to the return electrode 204 and may be composed of anelectrically insulating material such as epoxy, plastic, ceramic,silicone, glass or the like. Support member 200 extends from the distalend 108 of elongate shaft 106 (usually about 1 to 20 mm) and providessupport for active electrode 202.

FIG. 3 shows a cross-sectional elevation view of the wand 102 inaccordance with example embodiments. In particular, wand 102 comprises asuction lumen 206 defined within the elongate shaft 106. In the examplewand 102 of FIG. 3, the inside diameter of the elongate shaft 106defines the section lumen 206, but in other cases a separate tubingwithin the elongate shaft 106 may define the suction lumen 206. Thesuction lumen 206 may be used for aspirating excess fluids, bubbles,tissue fragments, and/or products of ablation from the target siteproximate to the active electrode 202. Suction lumen 206 extends intothe handle 110 and fluidly couples to the flexible tubular member 116for coupling to the peristaltic pump 118. Handle 110 also defines aninner cavity 208 within which electrical conductors 210 may reside,where the electrical conductors 210 may extend into the multi-conductorcable 112 and ultimately couple to the controller 104. The electricalconductors likewise extend through the elongate shaft and couple, oneeach, to the return electrode 204 and the active electrode 202, but theelectrical conductors 210 are not shown to reside within the elongateshaft 106 so as not to unduly complicate the figure.

FIG. 4 shows an elevation view of an example active electrode (on theleft), as well as a perspective view of the distal end of wand 102 (onthe right), in accordance with example systems. In particular, activeelectrode 202 may be an active screen electrode 400 as shown in FIG. 4.Screen electrode 400 may comprise a conductive material, such astungsten, titanium, molybdenum, platinum, or the like. Screen electrode400 may have a diameter in the range of about 0.5 to 8 mm, in some casesabout 1 to 4 mm, and a thickness of about 0.05 to about 2.5 mm, in somecases about 0.1 to 1 mm. Screen electrode 400 may comprise a pluralityof apertures 402 configured to rest over the distal opening 404 ofsuction lumen. Apertures 402 are designed to enable the passage ofaspirated excess fluids, bubbles, and gases from the ablation site andare large enough to enable ablated tissue fragments to pass through intosuction lumen 206 (FIG. 3). As shown, screen electrode 400 has anirregular shape which increases the edge to surface-area ratio of thescreen electrode 400. A large edge to surface-area ratio increases theability of screen electrode 400 to initiate and maintain a plasma layerin conductive fluid because the edges generate higher current densities,which a large surface area electrode tends to dissipate power into theconductive media.

In the representative embodiment shown in FIG. 4, screen electrode 400comprises a body 406 that rests over insulative support member 200 andthe distal opening 404 to suction lumen 206. Screen electrode 400further comprises tabs 408, in the example screen electrode 400 of FIG.4, five tabs 408 are shown. The tabs 408 may rest on, be secured to,and/or be embedded in insulative support member 200. In certainembodiments, electrical connectors extend through insulative supportmember 200 and are coupled (i.e., via adhesive, braze, weld, or thelike) to one or more of tabs 408 in order to secure screen electrode 400to the insulative support member 200 and to electrically couple screenelectrode 400 to controller 104 (FIG. 1). In example systems, screenelectrode 400 forms a substantially planar tissue treatment surface forsmooth resection, ablation, and sculpting of the meniscus, cartilage,and other tissues. In reshaping cartilage and meniscus, the physicianoften desires to smooth the irregular and ragged surface of the tissue,leaving behind a substantially smooth surface. For these applications, asubstantially planar screen electrode treatment surface provides thedesired effect. The specification now turns to a more detaileddescription of the controller 104.

FIG. 5 shows an electrical block diagram of controller 104 in accordancewith at least some embodiments. In particular, the controller 104comprises a processor 500. The processor 500 may be a microcontroller,and therefore the microcontroller may be integral with read-only memory(ROM) 502, random access memory (RAM) 504, digital-to-analog converter(D/A) 506, analog-to-digital converter (A/D) 514, digital outputs (D/O)508, and digital inputs (D/I) 510. The processor 500 may further provideone or more externally available peripheral busses, such as a serial bus(e.g., I²C), parallel bus, or other bus and corresponding communicationmode. The processor 500 may further be integral with communication logic512 to enable the processor 500 to communicate with external devices, aswell as internal devices, such as display device 130. Although in someembodiments the processor 500 may be implemented in the form of amicrocontroller, in other embodiments the processor 500 may beimplemented as a standalone central processing unit in combination withindividual RAM, ROM, communication, A/D, D/A, D/O, and D/I devices, aswell as communication hardware for communication to peripheralcomponents.

ROM 502 stores instructions executable by the processor 500. Inparticular, the ROM 502 may comprise a software program that, whenexecuted, causes the controller to implement two or more modes ofoperation. The RAM 504 may be the working memory for the processor 500,where data may be temporarily stored and from which instructions may beexecuted. Processor 500 couples to other devices within the controller104 by way of the digital-to-analog converter 506 (e.g., in someembodiment the RF generator 516), digital outputs 508 (e.g., in someembodiment the RF generator 516), digital inputs 510 (e.g., interfacedevices such as push button switches 132 or foot pedal assembly 134(FIG. 1)), communication device 512 (e.g., display device 130).

Voltage generator 516 generates an alternating current (AC) voltagesignal that is coupled to active electrode 202 of the wand 102. In someembodiments, the voltage generator defines an active terminal 518 whichcouples to electrical pin 520 in the controller connector 120,electrical pin 522 in the wand connector 114, and ultimately to theactive electrode 202. Likewise, the voltage generator defines a returnterminal 524 which couples to electrical pin 526 in the controllerconnector 120, electrical pin 528 in the wand connector 114, andultimately to the return electrode 204. Additional active terminalsand/or return terminals may be used. The active terminal 518 is theterminal upon which the voltages and electrical currents are induced bythe voltage generator 516, and the return terminal 524 provides a returnpath for electrical currents. It would be possible for the returnterminal 524 to provide a common or ground being the same as the commonor ground within the balance of the controller 104 (e.g., the common 530used on push-buttons 132), but in other embodiments the voltagegenerator 516 may be electrically “floated” from the balance of thecontroller 104, and thus the return terminal 524, when measured withrespect to the common or earth ground (e.g., common 530) may show avoltage; however, an electrically floated voltage generator 516 and thusthe potential for voltage readings on the return terminals 524 relativeto earth ground does not negate the return terminal status of theterminal 524 relative to the active terminal 518.

The AC voltage signal generated and applied between the active terminal518 and return terminal 524 by the voltage generator 516 is RF energythat, in some embodiments, has a frequency of between about 5 kilo-Hertz(kHz) and 20 Mega-Hertz (MHz), in some cases being between about 30 kHzand 2.5 MHz, in other cases being between about 50 kHz and 500 kHz,often less than 350 kHz, and often between about 100 kHz and 200 kHz. Insome applications, a frequency of about 100 kHz is useful because targettissue impedance is much greater at 100 kHz.

The RMS (root mean square) voltage generated by the voltage generator516 may be in the range from about 5 Volts (V) to 1800 V, in some casesin the range from about 10 V to 500 V, often between about 10 V to 400 Vdepending on the active electrode size. The peak-to-peak voltagegenerated by the voltage generator 516 for ablation in some embodimentsis a square waveform with a peak-to-peak voltage in the range of 10 V to2000 V, in some cases in the range of 100 V to 1800 V, in other cases inthe range of about 28 V to 1200 V, and often in the range of about 100 Vto 320V peak-to-peak.

The voltage and current generated by the voltage generator 516 may bedelivered in a series of voltage pulses or AC voltage with asufficiently high frequency (e.g., on the order of 5 kHz to 20 MHz) suchthat the voltage is effectively applied continuously (as compared with,e.g., lasers claiming small depths of necrosis, which are pulsed about10 Hz to 20 Hz). In addition, the duty cycle (i.e., cumulative time inany one-second interval that energy is applied) of a square wave voltageproduced by the voltage generator 516 is on the order of about 50% forsome embodiments as compared with pulsed lasers which may have a dutycycle of about 0.0001%. Although square waves are generated and providedin some embodiments, the AC voltage signal is modifiable to include suchfeatures as voltage spikes in the leading or trailing edges of eachhalf-cycle, or the AC voltage signal is modifiable to take particularshapes (e.g., sinusoidal, triangular).

The voltage generator 516 delivers average power levels ranging fromseveral milliwatts to hundreds of watts per electrode, depending on themode of ablation and state of the plasma proximate to the activeelectrode. The voltage generator 516 in combination with the processor500 are configured to initially set the energy output of the voltagegenerator 516 (e.g., by controlling output voltage) based on the mode ofablation selected by the surgeon, and while in a selected mode ofablation to make control changes to compensate for changes caused by useof the wand. The control changes are discussed more below after afurther discussion of the peristaltic pump 118. A description of variousvoltage generators 516 can be found in commonly assigned U.S. Pat. Nos.6,142,992 and 6,235,020, the complete disclosure of both patents areincorporated herein by reference for all purposes. Reference is alsomade to commonly assigned U.S. Pat. No. 8,257,350, entitled “METHOD ANDSYSTEM OF AN ELECTROSURGICAL CONTROLLER WITH WAVE-SHAPING”, the completedisclosure of which is incorporated herein by reference as if reproducedin full below.

In some embodiments, the various modes of operation implemented, atleast in part, by the voltage generator 516 may be controlled by theprocessor 500 by way of digital-to-analog converter 506. For example,the processor 500 may control the output voltages by providing one ormore variable voltages to the voltage generator 516, where the voltagesprovided by the digital-to-analog converter 506 are proportional to thevoltages to be generated by the voltage generator 516. In otherembodiments, the processor 500 may communicate with the voltagegenerator by way of one or more digital output signals from the digitaloutput converter 508, or by way of packet-based communications using thecommunication device 512 (the communication-based embodiments notspecifically shown so as not to unduly complicate FIG. 5).

Still referring to FIG. 5, in some embodiment the controller 104 furthercomprises a mechanism to sense the electrical current provided to theactive electrode. In the illustrative case of FIG. 3, sensing currentprovided to the active electrode may be by way of a current sensetransformer 532. In particular, current sense transformer 532 may have aconductor of the active terminal 518 threaded through the transformersuch that the active terminal 518 becomes a single turn primary. Currentflow in the single turn primary induces corresponding voltages and/orcurrents in the secondary. Thus, the illustrative current sensetransformer 532 is coupled to the analog-to-digital converter 514 (asshown by the bubble A). In some cases, the current sense transformer maycouple directly to the analog-to-digital converter 514, and in othercases additional circuitry may be imposed between the current sensetransformer 532 and the analog-to-digital converter 514, such asamplification circuits and protection circuits. The current sensetransformer is merely illustrative of any suitable mechanism to sensethe current supplied to the active electrode, and other systems arepossible. For example, a small resistor (e.g., 1 Ohm, 0.1 Ohm) may beplaced in series with the active terminal 518, and the voltage dropinduced across the resistor used as an indication of the electricalcurrent. In yet still other cases, current sense circuitry may measurethe current in any suitable form, and the measured current values may beprovided other than by analog signal, such as by way of packet-basedcommunications over the communication port 512 (not shown so as not tounduly complicate the drawing).

Given that the voltage generator 516 is electrically floated, themechanism to sense current is not limited to the just the activeterminal 518. Thus, in yet still further embodiments, the mechanism tosense current may be implemented with respect to the return terminal524. For example, illustrative current sense transformer 532 may beimplemented on a conductor associated with the return terminal 524.

In some embodiments, the only feedback parameter used by the processorregarding the voltage generator 516 is the electrical current flow. Forexample, in systems where the voltage generator can accurately producean output voltage independent of the impedance of the attached load, theprocessor 500 having set point control for the voltage created by thevoltage generator 516 may be sufficient (e.g., to calculate a valueindicative of impedance of the plasma proximate the active electrode).However, in other cases, voltage may also be a feedback parameter. Thus,in some cases the active terminal 518 may be electrically coupled to theanalog-to-digital converter 514 (as shown by bubble B). However,additional circuitry may be imposed between the active terminal 518 andthe analog-to-digital converter 514, for example various step-downtransformers, protection circuits, and circuits to account for theelectrically floated nature of the voltage generator 516. Suchadditional circuitry is not shown so as not to unduly complicate thefigure. In yet still other cases, voltage sense circuitry may measurethe voltage, and the measured voltage values may be provided other thanby analog signal, such as by way of packet-based communications over thecommunication port 512 (not shown so as not to unduly complicate thedrawing).

Still referring to FIG. 5, controller 104 in accordance with variousembodiments further comprises peristaltic pump 118. The peristaltic pump118 may reside at least partially within the enclosure 122. Theperistaltic pump comprises the rotor 124 mechanically coupled to a shaftof the electric motor 534. In some cases, and as illustrated, the rotorof the electric motor may couple directly to the rotor 124, but in othercases various gears, pulleys, and/or belts may reside between theelectric motor 534 and the rotor 124. The electric motor 534 may takeany suitable form, such as an AC motor, a DC motor, and/or astepper-motor. To control speed of the shaft of the electric motor 534,and thus to control speed of the rotor 124 (and the volumetric flow rateat the wand), the electric motor 534 may be coupled to a motor speedcontrol circuit 536. In the illustrative case of an AC motor, the motorspeed control circuit 536 may control the voltage and frequency appliedto the electric motor 534. In the case of a DC motor, the motor speedcontrol circuit 536 may control the DC voltage applied to the electricmotor 534. In the case of a stepper-motor, the motor speed controlcircuit 536 may control the current flowing to the poles of the motor,but the stepper-motor may have a sufficient number of poles, or iscontrolled in such a way, that the rotor 124 moves smoothly.

The processor 500 couples to the motor speed control circuit 536, suchas by way of the digital-to-analog converter 506 (as shown by bubble C).The processor 500 may be coupled in other ways as well, such aspacket-based communication over the communication port 512. Thus, theprocessor 500, running a program, may read electrical current suppliedon the active terminal 518, may read voltage supplied on the activeterminal 518, and responsive thereto may make speed control changes (andthus volume flow rate changes) by sending speed commands to the motorspeed control circuit 536. The motor speed control circuit 536, in turn,implements the speed control changes. Speed control changes maycomprises changes in speed of the rotor 124 when desired, stopping therotor 124 when desired, and in some embodiments temporarily reversingthe rotor 124. Before proceeding it is noted that the rotor 124 of theperistaltic pump need not be turned by an electric motor. While anelectric motor may be easier to implement in an electrical-based controlsystem, other types of motors for which speed of the output shaft can becontrolled (e.g., pneumatic motors) may be equivalently used.

The specification now turns to a more detailed description of thevarious modes of operation that may be implemented by theelectrosurgical system. Each mode of operation is illustratively namedbased on the aggressiveness of the ablation. However, all theillustratively identified tissue types may be ablated in each and everymode, and thus providing an indication of the type of tissue expected tobe ablated in each mode shall not be read as a limitation of theapplicability of any particular mode. Ablating tissue in a mode notspecifically designed for the tissue may result unwanted effects, suchas discoloration or removal of too much of the target tissue. Theavailable modes of operation of the system thereby provide enhancedperformance where the management of energy output in conjunction withcontrol of aspiration flow rates creates surgical results in each modethat are tuned to the targeted tissue or type of surgical procedure.

In accordance with the various embodiments, the electrosurgicalcontroller 100 implements at least two, and in some embodiments four,modes of operation to modulate the flow rate dynamically in the vicinityof an active electrode in order to regulate the output of RF energy: a“low mode” which may be used for treatment, ablation, and removal ofportions of cartilage; a “medium mode” which may be used for treatment,ablation, and removal of meniscus; a “high mode” which may be used foraggressive ablation and removal of tissue; and a “vacuum mode” forremoval free floating and/or trapped tissue. Each illustrative mode ofoperation may be characterized by an initial energy setting for thevoltage generator 516 and an initial volume flow rate by the peristalticpump 118, which initial settings may result in a particular desiredimpedance of the plasma created during ablation. During operation withina particular mode, the energy provided by the voltage generator 516 andvolume flow rate provided by the peristaltic pump 118 may change basedon operational conditions at the distal end 108 of the wand, but suchchanges shall not obviate the status of being within a particularoperational mode. The following table characterizes at a high level thefour illustrative operational modes.

TABLE 1 Low Mode Medium Mode High Mode Vacuum Mode Low energy Mediumenergy High energy to Low to High energy to active to active activeelectrode. to active electrode. electrode. electrode. Low Medium Highaspiration Very high or pulsed aspiration aspiration flow. flow.aspiration flow. flow.

Each mode will be discussed in turn.

The low mode of operation is designed specifically for the treatment andselective ablation of articular cartilage or other very sensitivetissue. This low mode of operation is particularly appropriate forchondroplasty and meniscus finishing or sculpting. However, cartilagedoes not grow back, and thus the amount of cartilage ablated by asurgeon during a chondroplasty procedure is in most procedures verysmall. The primary concern of the surgeon may be to carefully removediseased cartilage while at the same time reducing the damage to thechondral tissue that remains. For these reasons, the illustrative lowmode is characterized by low energy provided to the active electrode, aswell as low volume flow rate for the aspiration. In particular, in thismode of operation energy delivery during treatment is desired tomaximize cell viability and to create reduced instantaneous energydissipation and heat production in the vicinity of the treatment site.The reduced suction flow and low volume flow rate associated with thismode of operation may result in a plasma and electrode circuit having ahigher overall impedance.

Vapor layer collapse and short spike of current are avoided if possiblein the low mode, and thus volume flow rate control in the low mode mayimplement aggressive control action with respect to slowing the volumeflow rate (i.e., decreases in speed of the rotor 124 of the peristalticpump 118) in order to maintain the efficacy and stability of the plasma.In some cases, the control action may result in momentary reversals ofdirection of the rotor 124 of the peristaltic pump 118. Reversal of therotor 124 of the peristaltic pump 118 may not result in reverse volumeflow rate at the active electrode 202 (taking into account elasticity ofthe tubing 116), but nevertheless may enable the controller 104 toquickly slow or stop the volume flow rate at the active electrode whenthe controller 104 senses the plasma is collapsing. In order to reducethermal damage to surrounding tissue, in the low mode it may bedesirable to reduce aspiration volume flow to substantially zero whilethe RF energy is activated. The control action would then provide for abaseline aspiration volume flow rate when the RF is deactivated in orderto remove loose tissue bodies and to evacuate bubbles from the surgicalfield to improve visualization.

With respect to the voltage generator 516, the low mode is characterizedby low energy, and in some embodiments the controller 104 implements anupper limit on the amount of energy provided to the active electrode202. For a voltage generator 516 that produces constant RMS voltage, theamount of current provided to the active electrode 202 may becontrolled. For a voltage generator 516 that controls voltage output,both the RMS voltage and RMS current may be controlled to implement lowenergy delivery.

In the low mode of operation, the controller 104 controls the voltagegenerator 516 and peristaltic pump 118 to implement relatively hightarget impedance for the plasma and electrode circuit, and to avoidplasma collapse. Control action in response to decreasing impedance (ascalculated based on the current and/or voltage applied to the activeelectrode) may involve both lowering the energy supplied by the voltagegenerator 516 and slowing and/or stopping the peristaltic pump 118. Insome embodiments, changes in the electrical energy produced by thevoltage generator 516 may be implemented more quickly than changes inperistaltic pump 118 speed, and thus in some embodiments an initialreaction to measured decreasing plasma impedance may be momentarilyincreasing the level of supplied energy, followed by decreasing pumpspeed and lowering again the supplied energy.

The medium mode of operation is designed specifically for ablation offibro-cartilaginous tissue like meniscal tissue, but other types oftissue may also be ablated in the medium mode. This medium mode ofoperation may also be appropriate for the electrosurgical treatment oflabrum tissue. When ablating meniscus, the surgeon may be interested inablating more tissue volume than with respect to cartilage, but anyresulting oxidation or “browning” of the remaining meniscus isdisfavored. For at least this reason, the illustrative medium mode ischaracterized by medium energy provided to the active electrode, as wellas medium volume flow rate of the aspiration in order to preserve tissueconsistency. In particular, in this mode of operation energy deliveryduring treatment is desired to increase tissue matrix preservation andto prevent tissue matrix alteration with reduced or no tissuediscoloration, or cross-linking of the collagen fibers that could resultin mechanical alterations. The medium volume flow rate may result in aplasma that has a lower impedance than the low mode along withrelatively little heat dissipation in the area of the treatment site.

Plasma collapse is disfavored in the medium mode, but occasional plasmacollapse and short current spikes may be tolerated to implement theslightly more aggressive tissue ablation rate. Thus, control action withrespect to the volume flow rate in the meniscus mode may be moreaggressive than the low mode, and a minimum volume flow rate for theaspiration may be implemented, even if such minimum results in plasmacollapse.

With respect to the voltage generator 516, the medium mode ischaracterized by slower changes responsive to variations in impedance ofthe plasma. For a voltage generator 516 that produces constant peakvoltage, the amount of current provided to the active electrode 202 maybe averaged and controlled to provide a predetermined average current.For a voltage generator 516 that controls voltage output, the averageenergy may be controlled.

In the medium mode of operation, the controller 104 controls the voltagegenerator 516 and peristaltic pump 118 to implement a medium targetimpedance for the plasma electrode circuit. Control action in responseto decreasing impedance (as calculated based on the current and/orvoltage applied to the active electrode) may involve both changing theenergy supplied by the voltage generator 516 and slowing and/or stoppingthe peristaltic pump 118. In some embodiments, the controller 104 mayprovide predetermined energy, and for impedance values falling within apredetermined range, the controller 104 may control impedance basedsolely on changes in speed of the peristaltic pump 118. For variationsin impedance that fall outside with a predetermined range, the controlstrategy may also rely on changes in energy supplied by the voltagegenerator 516.

The illustrative high mode of operation is designed specifically forquickly removing tissue. By way of example, this high mode of operationmay be used for sub-acromial decompression treatments or ACL stumpdebridement. For this reason, the illustrative high mode ischaracterized by high energy provided to the active electrode, as wellas high volume flow rate for aspiration. In particular, in this mode ofoperation energy delivery during treatment is adjusted for increasedtissue removal with continuous aspiration flow volume to pull tissuecloser to the wand for more efficient ablation rates and for reducedheat dissipation. The high volume flow rate will result in plasma havinglower impedance, and regular (but uncontrolled) plasma collapse. Thus,plasma collapse is expected in the high mode based on the aggressiveaspiration flow, but the high mode may implement a minimum volume flowrate, and thus a minimum peristaltic pump speed, even if such minimumspeed results in plasma collapse.

With respect to the voltage generator 516, the high mode ischaracterized by slower changes responsive to variations in impedance ofthe plasma. Changes in energy provided to the wand electrode may beimplemented slowly, but with the voltage generator 516 quicklythrottling energy, or shutting off completely, when a predetermined highenergy level is reached (e.g., over two Amps). For a voltage generator516 that produces constant RMS voltage, the amount of current providedto the active electrode 202 may be controlled to a predeterminedamperage. For a voltage generator 516 that controls voltage output, theaverage power may be controlled.

In the high mode of operation, the controller 104 controls the voltagegenerator 516 and peristaltic pump 118 to implement low target impedancefor the plasma. Control action in response to decreasing impedance (ascalculated based on the current and/or voltage applied to the activeelectrode) may involve slowing the peristaltic pump 118, but only topredetermined minimum volume flow rate. In some embodiments, thecontroller 104 may provide predetermined energy, and for impedancevalues falling within a predetermined range, the controller 104 maycontrol impedance based solely on changes in speed of the peristalticpump 118. For variations in impedance that fall outside a predeterminedrange, the control may also rely on changes in energy supplied by thevoltage generator 516.

Plasma collapse is expected, yet in the high mode the precise timing ofplasma collapse is uncontrolled. In a particular embodiment, thecontroller 104 aggregates or counts an amount of time that a plasmaexists proximate the active electrode, and also the total time (over anysuitable period, such as a one second). For example, the controller mayassume that at times when current is below a predetermined threshold(e.g., 500 milli-Amps) that plasma exists (as higher current will flowwhen in the absence of the impedance associated with the plasma).Responsive to the aggregated time in the plasma mode, the controller 104may determine a value indicative of the “duty cycle” of the plasma tonon-plasma times, such as by taking a ratio time when plasma is presentto total time in the period. If the value indicative of the duty cycleindicates operation outside the plasma mode more than a predeterminedamount (e.g., less than 25% of the time), control changes may be made,like decreasing the aspiration flow rate.

The illustrative vacuum mode of operation is designed specifically forquickly removing loose tissue and tissue fragments within the surgicalfield. For this reason, the illustrative vacuum mode is characterized byvariable energy provided to the active electrode, as well as the highestvolume flow rate as between the various modes (when the aspiration isactive). In particular, in this mode of operation energy delivery duringtreatment is desired to be optimized for fast digestion of debris withinthe surgical field in conjunction with a high volume flow rate in orderto attract debris to the wand tip. The high volume flow rate will resultin plasma having lower impedance.

Plasma collapse is expected in the vacuum mode based on the aggressivevolume flow rate for the aspiration. In some cases the flow rate volumewill be set and remain unchanged throughout use of the mode. In othercases, the vacuum mode may implement pulsed volume flow rate,alternating between the highest volume flow rate for aggressive tissueremoval, and a lower volume flow rate to enable an extinguished plasmato “re-ignite.” For example, in one illustrative pulsating flowembodiment the higher volume flow rate may be implemented for 0.5seconds, and then the lower volume flow rate implemented for 0.5seconds. Other times are possible, with the higher volume flow rateranging from between 0.1 and 1.0 seconds, and the lower volume flow rateranging from between 0.1 and 1.0 seconds. Moreover, the times as betweenthe higher volume flow rate and the lower volume flow rate need not bebalanced.

With respect to the voltage generator 516, the vacuum mode ischaracterized by slower changes responsive to changes in impedance ofthe plasma and electrode circuit. Changes in energy provided may beimplemented slowly, but with the voltage generator 516 quicklythrottling energy, or shutting off completely, when a predetermined highenergy level is reached (e.g., over two amps). For a voltage generator516 that produces constant peak voltage, the amount of current providedto the active electrode 202 may be controlled to a predeterminedamperage. For a voltage generator 516 that controls voltage output, theaverage power may be controlled.

In the vacuum mode of operation, the controller 104 may not makeoperative control changes (other than implementing the pulsatingaspiration flow). In other words, changes in impedance of plasma may notresult in changes in set point current and/or energy provided to thevoltage generator 516 by the processor 500. In other cases, changes inenergy delivery are slower than the other modes of operation, withoccasional reductions at and/or shut down of energy associated with apredetermined high energy flow.

FIG. 6 shows a graph that relates possible ranges of output RF energy toaspiration flow rate (shown as pump speed settings) for three exampleoperational modes—low mode, medium mode, and high mode. In particular,for each mode of operation the electrosurgical controller 104 isprogrammed to operate within a range of operational parametersassociated with output RF energy and aspiration flow rate. For example,in the “low mode” of operation described above, controller 104 may bepre-programmed to allow output RF energy only in a range from 25-50Watts, and aspiration flow rates set points from an example “−1” (i.e.,reverse motor direction) to “5”, which in some cases may result in anaspiration flow in a range from 0-45 ml/min. For the example “mediummode” of operation described above, controller 104 may be pre-programmedto allow output RF energy only in a range from 50-150 Watts, andaspiration flow rates set points from an example “0” (i.e., peristalticmotor stopped) to “5”. For the example “high mode” of operationdescribed above, controller 104 may be pre-programmed to allow output RFenergy only in a range from 150-400 Watts, and aspiration flow rates setpoints from an example “1” to “5”.

Though each mode may be characterized by particular energy and volumeflow rate, to help initially establish plasma, the volume flow rate mayinitially be lower, and likewise the voltage of the applied energy maybe lower, to help establish a gas phase of the fluid near the activeelectrode. Moreover, and again regardless of mode of operation, onceplasma has been created at a lower volume flow rate and applied voltage,the ramping of the voltage and volume flow rate to the initial setpoints for the mode of operation may be synchronized. In accordance withat least some embodiments, the voltage generated 516 is configured tolimit or interrupt current flow when low resistivity material (e.g.,blood, saline or electrically conductive gel) causes a lower impedancepath between the return electrode(s) and the active electrode(s).Further still, in some embodiments the voltage generator 516 isconfigured by the user to be a constant current source (i.e., the outputvoltage changes as function of the impedance encountered at the wand102).

The above discussion is meant to be illustrative of the principles andvarious embodiments of the present invention. Numerous variations andmodifications are possible. It is intended that the following claims beinterpreted to embrace all such variations and modifications. Forexample, while FIG. 6 shows non-overlapping output RF energy as betweenthe example modes of operation, the ranges are merely examples. In othersituations the output RF energy of the operational modes may overlap(e.g., the output RF energy of the lower end of the medium mode mayoverlap with the output RF energy of the upper end of the low mode).Thus, the specification should not be read to require that the variousexample operational modes require mutually exclusive output RF energyranges.

FIG. 7 is a block diagram, describing a method which may start (block700) and comprise: implementing at least two modes of operation duringan electrosurgical procedure, the implementing with a first activeelectrode of an electrosurgical wand coupled to an electrosurgicalcontroller (block 702), the implementing by: either controlling flow offluid into an aperture on a distal end of the electrosurgical wand, theaperture proximate to the first electrode or by controlling theimpedance of an electrode circuit (block 704); and either controllingenergy delivered to the first active electrode by an electrosurgicalcontroller or controlling impedance of the electrode circuit (block706). The method may then end (block 708).

While preferred embodiments of this disclosure have been shown anddescribed, modifications thereof can be made by one skilled in the artwithout departing from the scope or teaching herein. The embodimentsdescribed herein are exemplary only and are not limiting. Because manyvarying and different embodiments may be made within the scope of thepresent inventive concept, including equivalent structures, materials,or methods hereafter though of, and because many modifications may bemade in the embodiments herein detailed in accordance with thedescriptive requirements of the law, it is to be understood that thedetails herein are to be interpreted as illustrative and not in alimiting sense.

What is claimed is:
 1. An electrosurgical controller comprising: aprocessor; a memory coupled to the processor; a voltage generatoroperatively coupled to the processor, the voltage generator comprisingan active terminal; an aspiration control mechanism, for controlling anaspiration flow rate of fluid through an aspiration conduit operativelycoupled thereto, the aspiration control mechanism operatively coupled tothe processor; wherein the memory stores a program that, when executedby the processor, causes the processor to: implement a first mode ofablation by setting, via the aspiration control mechanism, theaspiration flow rate at a first rate and by setting a firstpredetermined energy provided by the voltage generator; and implement asecond mode of ablation by setting, via the aspiration controlmechanism, the aspiration flow rate at a second flow rate and by settinga second predetermined energy provided by the voltage generator, thesecond flow rate different than the first flow rate, and the secondpredetermined energy different than the first predetermined energy. 2.The electrosurgical controller of claim 1 wherein the program, duringeach mode of ablation, further causes the processor to: adjust theaspiration flow rate, via the aspiration control mechanism, responsiveto changes in a parameter indicative of impedance of the electrodecircuit; and adjust energy provided by the generator responsive tochanges in the parameter indicative of impedance of electrode circuit.3. The electrosurgical controller of claim 1 wherein the program, duringthe first mode of ablation, further causes the processor to: adjust theaspiration flow rate, via the aspiration control mechanism, to maintainthe parameter indicative of impedance of the electrode circuit within ahigh target electrode circuit impedance configured to form a stableplasma thus reducing plasma collapse.
 4. The electrosurgical controllerof claim 3 wherein the program, during the second mode of ablation,further causes the processor to: adjust the aspiration flow rate, viathe aspiration control mechanism, to maintain the parameter indicativeof impedance of the electrode circuit within a lower target electrodecircuit impedance than during the first mode, the lower target electrodecircuit impedance configured to allow some plasma collapse.
 5. Theelectrosurgical controller of claim 3 wherein when the processor adjuststhe aspiration flow rate, the program further causes the processor to atleast one selected from the group consisting of: momentarily stop theaspiration flow rate; and momentarily decrease the aspiration flow rate.6. The electrosurgical controller of claim 1 wherein the first mode ofablation and the second mode of ablation are each selected from thegroup consisting of: a low mode for use ablating cartilage; a mediummode for use ablating fibro-cartilage; a high mode for ablating softtissue; and a vacuum mode for removal of free floating tissue.
 7. Theelectrosurgical controller of claim 1 wherein the program further causesthe processor to implement a third mode of ablation by setting a thirdpredetermined aspiration control mechanism setting and by setting athird predetermined energy provided by the voltage generator, the thirdaspiration control mechanism setting different than the first and secondaspiration control mechanism settings, and the third predeterminedenergy different than the first and second predetermined energy.
 8. Theelectrosurgical controller of claim 7 wherein first, second and thirdmodes of ablation are each selected from the group consisting of: a lowmode for use ablating cartilage; a medium mode for use ablatingfibro-cartilage; a high mode for ablating soft tissue; and a vacuum modefor removal of free floating tissue.
 9. A system comprising: anelectrosurgical controller comprising a processor; a memory coupled tothe processor; a voltage generator operatively coupled to the processor,the voltage generator comprising an active terminal; a variableaspiration control system for controlling an aspiration flow ratethrough an aspiration conduit operatively coupled thereto, the variableaspiration control system operatively coupled to the processor; anelectrosurgical wand comprising an elongate shaft that defines aproximal end and a distal end; a first active electrode disposed on thedistal end of the elongate shaft; wherein the memory stores a programthat, when executed by the processor, causes the processor to implementat least two modes of ablation during an electrosurgical procedure, theimplementing with the first active electrode of the electrosurgicalwand; wherein when the program implements the at least two modes, theprogram causes the processor to: control impedance of an electrodecircuit during a first mode of ablation of an electrosurgical procedure;and then control impedance of the electrode circuit during a second modeof ablation of the electrosurgical procedure, the impedance of theelectrode circuit during the second mode different than the impedance ofthe electrode circuit during the first mode.
 10. The system of claim 9wherein when the processor controls the impedance of the electrodecircuit during the first mode of ablation, the program causes theprocessor to: control flow of fluid into an aperture on the distal endof the electrosurgical wand, the aperture proximate to the first activeelectrode; and control energy delivered to the first active electrode bythe electrosurgical controller.
 11. The system of claim 10 wherein whenthe processor controls the impedance of the electrode circuit during thesecond mode of ablation, the program causes the processor to: controlflow of fluid into the aperture, the flow of fluid in the second modedifferent than the flow of fluid in the first mode; and control energydelivered to the first active electrode, the energy delivered to thefirst active electrode in the second mode different than the energydelivered to the first active electrode in the first mode.
 12. Thesystem of claim 10 wherein when the processor controls the flow of fluidinto the aperture, the program causes the processor to control a meansfor controlling the variable aspiration control system.
 13. The systemof claim 10 wherein when the processor controls the impedance of theelectrode circuit during the first mode of ablation the program causesthe processor to: vary the aspiration flow rate, via the variableaspiration control system, to maintain the impedance of the electrodecircuit within a high target electrode circuit impedance rangeconfigured to form a stable plasma at the first active electrode andthus reducing plasma collapse.
 14. The electrosurgical controller ofclaim 13 when the processor controls the impedance of the electrodecircuit during the first mode of ablation the program causes theprocessor to: vary the aspiration flow rate, via the variable aspirationcontrol system, to maintain the impedance of the electrode circuitwithin a lower target electrode circuit impedance range than during thefirst mode of ablation, the lower target electrode circuit impedanceconfigured to form a allow some plasma collapse at the first activeelectrode.
 15. The system of claim 9 wherein the program, during eachmode of ablation, further causes the processor to: adjust a rate ofaspiration responsive to changes in a parameter indicative of impedanceof the electrode circuit; and adjust energy provided by the generatorresponsive to changes in the parameter indicative of impedance of theelectrode circuit.
 16. The system of claim 15 wherein when the processoradjusts the rate of aspiration, the program further causes the processorto at least one selected from the group consisting of: momentarily stopthe rate of aspiration; and momentarily increase the rate of aspiration.17. The system of claim 9 wherein the at least two modes of ablation areselected from the group consisting of: a low mode for use ablatingcartilage; a medium mode for use ablating fibro-cartilage; a high modefor ablating soft tissue; and a vacuum mode for removal of free floatingtissue.